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Tailor-made AlN-on-Si stacks
State-of-the-art AlN stack with high structural quality
Thickness ranging from 20 nm to 350 nm
Silicon substrate type and orientation upon request
May include highly efficient emitters such as quantum dots and quantum wells for the UV and visible ranges
May include a high-mobility electron gas
High etching selectivity with silicon
Smooth top and bottom surfaces
Ideal for various advanced applications in photonics, optomechanics, NEMS, sensors, acoustic resonators...
Contact us for detailed specifications!
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